Providing in-depth coverage of the techlogies and various approaches, Lumius Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this invative science. The book comprises four parts. Part 1 describes the fundamental difference between glow discharge of an inert gas and that of an organic vapor, from which the concepts of Lumius Gas Phase derive. Part 2 explores the various ways of practicing Lumius Vapor Disposition and Treatment depending on the type and nature of substrates. Part 3 covers some very important aspects of surface and interface that could t have been seen clearly without results obtained by application of LCVD. Part 4 offers some examples of interface engineering that show very unique aspects of LCVD interface engineering in composite materials, biomaterial surface and corrosion protection by the environmentally benign process. Timely and up-to-date, the book provides broad coverage of the complex relationships involved in the interface between a gas/solid, liquid/solid, and a solid/solid. The author presents a new perspective on low-pressure plasma and describes key aspects of the surface and interface that could t be shown without the results obtained by LCVD techlogies. Features * Provides broad coverage of complex relationships involved in interface between a gas/solid, a liquid/solid, and a solid/solid * Addresses the importance of the initial step of creating electrical glow discharge * Describes the principles of creating chemically reactive species and their growth in the lumius gas phase * Focuses on the nature of surface-state of solid and on the creation of imperturbable surface-state by the contacting phase or environment, which is vitally important in creating biocompatible surface, providing super corrosion protection of metals by environmentally benign processes, etc. * Offers examples on how to use LCVD in the interface engineering process * Presents a new view on low-pressure (low-temperature) plasma and emphasizes the importance of lumius gas phase and chemical reactions that occur in the phase About the author: Dr. Yasuda is one of the pioneers who explored low-pressure plasma for surface modification of materials and deposition of na films as barrier and perm-selective membranes in the late 1960s. He obtained his PhD in physical and polymer chemistry working on transport properties of gases and vapors in polymers at State University of New York, College of Environmental Science and Forestry at Syracuse, NY. He has over 300 publications in refereed journals and books, and is currently a Professor Emeritus of Chemical Engineering, and Director, Center for Surface Science & Plasma Techlogy, University of Missouri-Columbia, and is actively engaged in research on the subjects covered by this book.