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Simulation of Semiconductor Processes and Devices 2001: SISPAD 01 by Christos Tsamis, Dimitris Tsoukalas (Hardcover, 2001)

This volume contains the Proceedings of the International Conference on Simulation of Semiconductor Devices and Processes, SISPAD1, held on September 5-7, 2001, in Athens. The conference provided an open forum for the presentation of the latest results and trends in process and device simulation. The trend towards shrinking device dimensions and increasing complexity in process technology demands the continuous development of advanced models describing basic physical phenomena involved. New simulation tools are developed to complete the hierarchy in the Technology Computer Aided Design simulation chain between microscopic and macroscopic approaches. The conference program featured 8 invited papers, 60 papers for oral presentation and 34 papers for poster presentation, selected from a total of 165 abstracts from 30 countries around the world. These papers disclose new and interesting concepts for simulating processes and devices.

Subject Area
Material Science, Nanotechnology
Author
Christos Tsamis, Dimitris Tsoukalas
Publication Name
Simulation of Semiconductor Processes and Devices 2001: Sispad 01
Format
Hardcover
Language
English
Subject
Engineering & Technology
Publication Year
2001
Type
Textbook
Number of Pages
455 Pages

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